Название: Tantalum and Niobium-Based Capacitors: Science, Technology, and Applications, Second EditionАвтор: Yuri Freeman
Издательство: Springer
Год: 2022
Страниц: 161
Язык: английский
Формат: pdf (true)
Размер: 10.2 MB
This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb). Technology-related coverage includes chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated. The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc.
Tantalum capacitors are broadly used in modern electronics due to their record high charge and energy efficiency and capacitance stability over temperature and bias voltage. In some applications, niobium-based capacitors can be used as substitutes for tantalum capacitors. Y. Freeman’s book Tantalum and Niobium-Based Capacitors, published by Springer in 2017, is the only book dedicated to the science, technology, and applications of these capacitors. This book received excellent feedback from the industry and academia. Since the publication of the first edition, principally important new results on the impact of technology on the reliability, failure mode, volumetric efficiency, and environmental stability of Solid Electrolytic and Polymer Tantalum capacitors, which dominate the market, were obtained. Based on these results, new possibilities for the reliable mission critical applications of the surface mount tantalum capacitors manufactured with advanced technologies were demonstrated. These new results not only significantly expand the scope of the book but also provide important corrections and clarity to the earlier published material. The expanded second edition of the book Tantalum and Niobium-Based Capacitors: Science, Technology, and Applications with these additions, corrections, clarifications, and new application opportunities will be of great interest to the developers, makers, and users of tantalum and niobium-based capacitors in related industries as well as electrical engineering and material science faculty and university students.
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